학술논문

Thick-emitter silicon solar cells
Document Type
Conference
Source
Conference Record of the Twentieth IEEE Photovoltaic Specialists Conference Photovoltaic Specialists Conference, 1988., Conference Record of the Twentieth IEEE. :429-434 vol.1 1988
Subject
Photonics and Electrooptics
Components, Circuits, Devices and Systems
Engineered Materials, Dielectrics and Plasmas
Power, Energy and Industry Applications
Silicon
Photovoltaic cells
Surface resistance
Voltage
Radiative recombination
Electrical resistance measurement
Surface texture
Coatings
Shadow mapping
Metals industry
Language
Abstract
Some results of a theoretical optimization of the emitter region of a silicon solar cell are presented. The best compromise between recombination current, quantum collection efficiency, and sheet resistance is found for relatively thick, moderately doped, surface-passivated emitters. Experimental evidence is given to support the thick-emitter philosophy. Efficiencies up to 19.1% (global AM1.5) and open-circuit voltages up to 670 mV (25 degrees C) have been measured in 2*2 cm/sup 2/ cells having a textured surface, a single-layer antireflection coating, and a 7% grid shadowing. Even though the junction depth is between 0.8 and 2.4 mu m, the internal quantum efficiency is still high, ranging from 91% to 75% for lambda =400 nm. The experiments include a determination of the influence of the metal grid coverage factor on open-circuit voltage, leading to the prediction of a high-voltage (660 mV) and high-efficiency (18.6%) capability for such an industrial metallization technology as screen printing.ETX

Online Access