학술논문
In situ microwave characterization of insulator thin films for interconnects of advanced circuits
Document Type
Conference
Author
Source
1998 IEEE MTT-S International Microwave Symposium Digest (Cat. No.98CH36192) Microwave symposium Microwave Symposium Digest, 1998 IEEE MTT-S International. 2:961-964 vol.2 1998
Subject
Language
ISSN
0149-645X
Abstract
An accurate and simple method to in-situ characterize the dielectric constant of insulator thin films is developed. Optimized devices under test are capacitive patches where insulator film is set in the future operational configuration. Dielectric constant is extracted by an optimization procedure based upon subnanosecond time domain reflectometry measurement and simulation. /spl epsiv//sub r/ is given into a 100 MHz-10 GHz frequency bandwidth.