부산대학교 도서관

We demonstrate high resolution extreme ultraviolet (EUV) coherent diffractive imaging in the most general reflection geometry by combining ptychography with tilted plane correction. This method makes it possible to image extended surfaces at any angle of incidence. Refocused light from a tabletop coherent high harmonic light source at 29 nm illuminates a nanopatterned surface at 45 degree angle of incidence. The reconstructed image contains quantitative amplitude and phase (in this case pattern height) information, comparing favorably with both scanning electron microscope and atomic force microscopy images. In the future, this approach will enable imaging of complex surfaces and nanostructures with sub-10 nm-spatial resolution and fs-temporal resolution, which will impact a broad range of nanoscience and nanotechnology including for direct application in actinic inspection in support of EUV lithography.