학술논문
Qualification, monitoring, and integration into a production environment of the world's first fully programmable illuminator
Document Type
Article
Author
McIntyre, Gregory; Corliss, Daniel; Groenendijk, Remco; Carpaij, Rene; van Niftrik, Ton; Landie, Guillaume; Tamura, Takao; Pepin, Thomas; Waddell, James; Woods, Jerry; Robinson, Chris; Tian, Kehan; Johnson, Richard; Halle, Scott; Kim, Ryoung-Han; Mclellan, Erin; Kato, Hirokazu; Scaduto, Anthony; Maier, Carl; Colburn, Matt
Source
Proceedings of SPIE; March 2011, Vol. 7973 Issue: 1 p797306-797306-13
Subject
Language
ISSN
0277786X
Abstract
This paper will describe the development, qualification, monitoring, and integration into a production environment of the world's first fully programmable illuminator for optical lithography. FlexRay TM, a programmable illuminator based on a MEMs multi-mirror array that was developed for TWINSCAN XT:19x0i and TWINSCAN NXT series ASML immersion scanners, was first installed in January 2010 at Albany Nanotech, with subsequent tools installed in IBM's East Fishkill Manufacturing facility. After a brief overview of the concept and benefits of FlexRay, this paper will provide a comprehensive assessment of its reliability and imaging performance. A CD-based pupil qualification (CDPQ) procedure will be introduced and shown to be an efficient and effective way to monitor pupil performance. Various CDPQ and in-resist measurement results will be described, offering convincing evidence that FlexRay reliably generates high-quality pupils and is well suited for high volume manufacturing at lithography's leading edge.