학술논문

Comparative study of thin film physical properties for TiNxdeposited by DC magnetron sputtering under temperatures less than 100°C on monocrystalline silicon and polycrystalline iron substrates
Document Type
Article
Source
Thin Solid Films; November 1999, Vol. 355 Issue: 1 p357-362, 6p
Subject
Language
ISSN
00406090
Abstract
In this research, titanium nitride thin films were deposited by reactive DC magnetron sputtering with two original constraints imposed by the expected industrial application as roll to roll decorative coating of steel: the samples should be connected to earth and should not be heated during deposition. Previous work has shown that low N2atmospheres should be maintained during sputtering processes in order to obtain a colour range from grey to gold. In this study, the nitrogen content measured by Resonant Nuclear Reaction Analysis and the crystal structure revealed by glancing angle X-ray diffraction, were used to determine the coating composition. The appearance presented in CIE L*a*b* colour coordinates and the micro-hardness obtained with a Berkovitch nano-indenter were also evaluated for all the films. Results obtained with the TiNxlayers deposited on monocrystalline polished silicon were then compared to coating physical properties measured on polycrystalline iron (α-Fe) substrates. Only the coating produced under the lowest N2gas flow exhibits a different nitrogen content on both substrates resulting in an hexagonal phase on iron. Colour differences appear and are probably due to different substrate roughness. Hardnesses between 12 and 22 GPa are obtained on both substrates. Such results tend to qualify this process for possible industrial application as a protective coating with a pleasant appearance.