학술논문

Study on High Quality Thermal Stress Cleavage of Thick Sapphire Wafer
Document Type
Article
Source
Key Engineering Materials; October 2019, Vol. 825 Issue: 1 p39-44, 6p
Subject
Language
ISSN
10139826; 16629795
Abstract
This study deals with high quality thermal stress cleavage of thick sapphire wafer with thickness of 5 mm. The influence of the distance from the edge to the initial crack, laser power, and plane orientation on the cleavage characteristics was experimentally investigated. The results indicate that the surface waviness Wa at the cleaved surface was influenced by the distance from the edge. A cleaved surface with good surface characteristics was obtained by cleaving with low laser power. The cleavage direction also affects the cleaved surface characteristics.