학술논문

Directly Photopatternable Polythiophene as Dual-Tone Photoresist
Document Type
Article
Source
Macromolecules; 20240101, Issue: Preprints
Subject
Language
ISSN
00249297; 15205835
Abstract
We report a directly photopatternable polythiophene derivative PToNBwith o-nitrobenzyl (oNB)-functionalized side chains. PToNBhas unique phototunable solubilities programmed through three stages: (i) organic-soluble/aqueous-insoluble, (ii) organic-insoluble/aqueous-insoluble, and (iii) organic-insoluble/aqueous soluble. The capability to control conjugated polymer solubility with spatiotemporal precision and orthogonal developer solvents through three stages allows for direct patterning of this conjugated polymer and provides flexibility to choose between positive and negative tone photolithography. This approach to photomodulate solubility also enables all-solution processing of multilayer stacked conjugated polymer films; we demonstrate here direct two-layer photopatterning with this novel conjugated polymer photoresist.