학술논문
Substrate Bias Voltage Tailoring the Interfacial Chemistry of a‑SiCx :H: A Surprising Improvement in Adhesion of a‑C:H Thin Films Deposited on Ferrous Alloys Controlled by Oxygen.
Document Type
Article
Author
Source
ACS Applied Materials & Interfaces; 5/15/2019, Vol. 11 Issue 19, p18024-18033, 10p
Subject
Language
ISSN
19448244