학술논문
Advanced processes in metal-oxide resists for high-NA EUV lithography
Document Type
Article
Author
Guerrero, Douglas; Amblard, Gilles R.; Dinh, Cong Que; Nagahara, Seiji; Cho, Kayoko; Tomori, Hikari; Kuwahara, Yuhei; Onitsuka, Tomoya; Okada, Soichiro; Kawakami, Shinichiro; Hara, Arisa; Fujimoto, Seiji; Muramatsu, Makoto; Tsuzuki, Reiko; Liu, Xiang; Thiam, Arame; Feurprier, Yannick; Nafus, Kathleen; Carcasi, Michael; Huli, Lior; Kato, Kanzo; Krawicz, Alexandra; Kocsis, Michael; De Schepper, Peter; McQuade, Lauren; Kasahara, Kazuki; Garcia Santaclara, Jara; Hoefnagels, Rik; La Fontaine, Bruno; Miyakawa, Ryan; Anderson, Chris; Naulleau, Patrick
Source
Proceedings of SPIE; April 2024, Vol. 12957 Issue: 1 p1295705-1295705-12
Subject
Language
ISSN
0277786X