학술논문
The fine structure of S and S?measured with the photodetachment microscope
Document Type
Article
Author
Source
Journal of Physics B: Atomic, Molecular and Optical Physics; March 2006, Vol. 39 Issue: 6 p1409-1416, 8p
Subject
Language
ISSN
09534075; 13616455
Abstract
Photodetachment microscopy of a beam of 32S?ions makes it possible to measure the detachment thresholds corresponding to different fine-structure levels of the negative ion S?and the neutral atom S. The electron affinity of sulfur, at 2.077 eV, is well suited for detachment by a tunable dye laser, which provides a third way of measuring neutral S fine structure, besides VUV spectroscopy of S I lines and direct fine-structure resonance spectroscopy. The fine-structure intervals are found to be 48?353.52(34) m?1for the 2P1/2? 2P3/2energy difference in S?, and 39?605.87(32) m?1for the 3P1? 3P2one in S (with expanded uncertainties), consistent with an independent measurement of the 3P0? 3P1interval. The new recommended electron affinity for isotope 32 of sulfur is 1675?297.60(42) m?1, or 2.077?104?18(71) eV.