학술논문

Structure of Inclusions in 4° Offcut 4H-SiC Epitaxy
Document Type
Article
Source
Materials Science Forum; April 2010, Vol. 645 Issue: 1 p315-318, 4p
Subject
Language
ISSN
02555476; 16629752
Abstract
The structure of various inclusions in SiC epitaxial layers grown on 4o offcut substrates was investigated using three advanced techniques. Using micro-Raman spectroscopy, the observed inclusions exhibited a complex structure having either different SiC polytypes like 3C or 6H or they were misoriented 4H-SiC inclusions. The UVPL images showed dislocations and other extended defects around the inclusion-related defects, and strain fields were observed in the x-ray topographs near the defect sites. Spectral UVPL imaging shows features with varying luminescence inside the inclusion related defects which propagate and may cause deformation in the crystalline structure and lead to non-radiative recombination centers within the defect.