학술논문
Pulse-time-modulated electron cyclotron resonance plasma discharge for highly selective, highly anisotropic, and charge-free etching.
Document Type
Article
Author
Source
Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1996, Vol. 14 Issue 6, p3049-3058, 10p
Subject
Language
ISSN
07342101