학술논문
Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl.
Document Type
Article
Author
Source
Journal of The Electrochemical Society; Oct2007, Vol. 154 Issue 10, pH899-G903, 5p, 6 Graphs
Subject
Language
ISSN
00134651