학술논문
Impact of VUV photons on SiO2 and organosilicate low-k dielectrics: General behavior, practical applications, and atomic models.
Document Type
Article
Author
Source
Applied Physics Reviews; 2019, Vol. 6 Issue 1, pN.PAG-N.PAG, 63p
Subject
Language
ISSN
19319401
Abstract
Copyright of Applied Physics Reviews is the property of American Institute of Physics and its content may not be copied or emailed to multiple sites or posted to a listserv without the copyright holder's express written permission. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)