학술논문
Resist process control for 32-nm logic node and beyond with NA > 1.30 immersion exposure tool.
Document Type
Article
Author
Nagahara, Seiji; Takahata, Kazuhiro; Nakagawa, Seiji; Murakami, Takashi; Takeda, Kazuhiro; Nakamura, Shinpei; Ueki, Makoto; Satake, Masaki; Ema, Tatsuhiko; Fujise, Hiroharu; Yonemitsu, Hiroki; Seino, Yuriko; Nakagawa, Shinichiro; Asano, Masafumi; Kitamura, Yosuke; Uchiyama, Takayuki; Mimotogi, Shoji; Tominaga, Makoto
Source
Proceedings of SPIE; Nov2009 Part 2, Issue 1, p72733A-72733A-11, 11p
Subject
Language
ISSN
0277786X