학술논문

Radiation-induced defect accumulation and annealing in Si-implanted gallium oxide.
Document Type
Article
Source
Journal of Applied Physics; 3/28/2022, Vol. 131 Issue 12, p1-10, 10p
Subject
RUTHERFORD backscattering spectrometry
ELECTRON energy loss spectroscopy
GALLIUM
SILICA
TRANSMISSION electron microscopy
Language
ISSN
00218979
Abstract
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