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Optimizing Stressor Film Deposition Sequence in Polish Rate Order for Best Planarization.

Document Type

Article

Author

Zhang, John H; Xiao, Changyong; Strane, Jay W; Venigalla, Rajasekhar; Economikos, Laertis; Hall, Lindsey; Chen, Jie; Stoll, Derek C; Wallner, Jin; Zhuang, Haoren; Ferreira, Paul; Kleemeier, Walter; Goldberg, Cindy; Moon, Yongsik; Truong, Connie; Sudijono, John; Chen, Xiaomeng; Sampson, Ron

Source

MRS Online Proceedings Library; 2011, Vol. 1335 Issue 1, p1-6, 6p

Subject

Language

ISSN

19464274

Online Access

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