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Lithography process optimization for 130-nm polygate mask and the impact of mask error factor.

Document Type

Article

Author

Hsu, Stephen; Shi, Xuelong; Socha, Robert J.; Chen, J. Fung; Yee, Jason C.; Anath, Mohan; Desai, Sunil; Imamura, Philip H.; Sherrill, Micheal J.; Tseng, Y. C.; Chang, H. A.; Kao, J. F.; Tseng, Alex; Liu, WeiJyh; Chen, Anseime; Lin, Arthur; Kujten, Jan P.; Jacobs, Eric; Verhappen, Arjan

Source

Proceedings of SPIE; Nov2001, Issue 1, p783-796, 14p

Subject

Language

ISSN

0277786X

Online Access

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