학술논문

Effect of Mask Geometry Variation on Plasma Etching Profiles †.
Document Type
Article
Source
Micromachines; Mar2023, Vol. 14 Issue 3, p665, 16p
Subject
PLASMA etching
PLASMA chemistry
FLASH memory
SEMICONDUCTOR design
RAY tracing
SEMICONDUCTOR devices
Language
ISSN
2072666X
Abstract
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