학술논문
Bias voltage influence on the a-SiCx:H interlayer deposition using tetramethylsilane: Decorative applications of a-C:H thin films on steel.
Document Type
Article
Author
Source
Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; Mar2024, Vol. 42 Issue 2, p1-8, 8p
Subject
Language
ISSN
07342101
Abstract
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