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Theoretical simulation of extreme UV radiation source for lithography.

Document Type

Article

Author

Fujima, Kazumi; Nishihara, Katsunobu; Kawamura, Toru; Furukawa, Hiroyuki; Kagawa, Takashi; Koike, Fumihiro; More, Richard; Murakami, Masakatsu; Nishikawa, Takeshi; Sasaki, Akira; Sunahara, Atsushi; Zhakhovskii, Vasillii; Fujimoto, Takashi; Tanuma, Hajime

Source

Proceedings of SPIE; Nov2004, Issue 1, p405-412, 8p

Subject

Language

ISSN

0277786X

Online Access

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