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Negative-tone resists for EUV lithography.

Document Type

Proceedings

Author

Suzuki, Masato; Kim, Youngjin; Her, Youngjun; Wu, Hengpeng; Si, Kun; Maturi, Mark Marcello; Fackler, Philipp Hans; Moinpour, Mansour; Dammel, Ralph; Cao, Yi

Source

Proceedings of SPIE; 4/11/2023, Vol. 12498, p1249813-1249813, 1p

Subject

Language

ISSN

0277786X

Online Access

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