학술논문
Optical lithography: Lithography at EUV wavelengths.
Document Type
Article
Author
Source
Subject
*INTEGRATED circuit design
*ULTRAVIOLET radiation
*LITHOGRAPHY
*SEMICONDUCTORS
*LIGHT sources
*EQUIPMENT & supplies
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Language
ISSN
1749-4885
Abstract
The article discusses on the extreme-ultraviolet (EUV) lithography to be introduced in the semiconductor chip manufacturing. It describes the characteristics of EUVs including easy absorption by air, optical elements needed to be reflective, and need for a bright light source. It states that the technology could become an alternative solution for the sub-13.5-nm lithography.