학술논문
In situ growth of SnO2 nanorodsby plasma treatment of SnO2 thin films.
Document Type
Article
Source
Subject
*THIN films
*NANOPARTICLES
*STRONTIUM
*CHEMICAL vapor deposition
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Language
ISSN
0957-4484
Abstract
Son2 thin films were deposited by RF inductively coupled plasmaenhanced chemical vapour deposition and then the as-depositedSnO2 thin films were immersed in the plasma for plasma post-treatment. UniformSnO2 nanorods were grownin situ from the SnO2 thin films during plasma treatment and formed a hybrid structure ofSnO2 nanorod thin films consisting of one-dimensionalSnO2 nanorods embedded in the two-dimensionalSnO2 thin film matrix.The growth of SnO2 nanorods follows a sputtering redeposition mechanism. Due to the intrinsically smallgrain size and high surface-to-volume ratios associated with the nanorods, theSnO2 nanorod thin films showed much higher sensitivity at lower operating temperaturestogether with faster response and shorter recovery time compared with the as-depositedSnO2 thin films. [ABSTRACT FROM AUTHOR]