학술논문

Intensity dependence of the third-harmonic-generation efficiency for high-power far-infrared radiation in n-silicon.
Document Type
Article
Source
Journal of Applied Physics. 2/1/1995, Vol. 77 Issue 3, p981. 4p.
Subject
*LASER beams
*SILICON
*DOPED semiconductors
Language
ISSN
0021-8979
Abstract
Presents a study that measured the third-harmonic generation of far-infrared laser radiation in doped silicon. Observation of the intensity dependence of its nonlinear coefficient; Information on the linear and nonlinear optical properties of doped semiconductors in the far-infrared regime.