학술논문

Raman scattering in polycrystalline silicon doped with boron.
Document Type
Article
Source
Journal of Applied Physics. 10/15/1992, Vol. 72 Issue 8, p3641. 7p. 1 Chart, 7 Graphs.
Subject
*POLYCRYSTALLINE semiconductors
*SEMICONDUCTOR doping
*ION implantation
*BORON
*RAMAN effect
Language
ISSN
0021-8979
Abstract
Presents a study which measured the Raman spectra of polycrystalline silicon doped with implanted boron before and after thermal annealing. Intensity ratio between the phonon mode; Raman spectra for polysilicon without ion implantation; Effects of annealing on the Raman spectra.