학술논문
CRYSTAL TEXTURE AND MECHANICAL STRESSES IN VO2 FILMS OBTAINED BY MOCVD.
Document Type
Article
Source
Subject
*STRAINS & stresses (Mechanics)
*CRYSTAL texture
*FUSED silica
*VAPOR-plating
*SILICON crystals
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Language
ISSN
0022-4766
Abstract
The texture of crystallites and mechanical stresses are investigated in polycrystalline VO2 films obtained by MOCVD from vanadyl acetylacetonate vapor at deposition temperatures from 380 °C to 590 °C. The films are deposited on single crystal silicon and quartz glass substrates. It is found that with increasing deposition temperature in this range the main crystallographic orientation of crystallites in the films changes twice. All films experience tensile stresses. Mechanical stresses reach maximum values within the deposition temperature range, which is caused by characteristic changes in the texture of film crystallites. [ABSTRACT FROM AUTHOR]