학술논문
Effects of discharge parameters on deposition rate of hydrogenated amorphous silicon for solar cells from pure SiH4 plasma.
Document Type
Article
Author
Source
Subject
*GLOW discharges
*SILICON
*HYDRIDES
*PLASMA gases
*SOLAR cells
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Language
ISSN
0021-8979
Abstract
Presents a study that investigated the effects of the radio frequency glow discharge parameters on the deposition rate of hydrogenated amorphous silicon for solar cells from pure silicon hydride (SiH[sub4]) plasma. Methodology; Analysis of the deposition rate and SiH[sub4] usage efficiency dependence on SiH[sub4]; Impact of pressure and SiH[sub4] flow rate on deposition rate.