학술논문

Temperature and strain dependence of the roughening transition in III-V semiconductor and SiGe epitaxial growth.
Document Type
Article
Source
Journal of Applied Physics. 7/15/1995, Vol. 78 Issue 2, p811. 6p. 6 Black and White Photographs, 1 Diagram, 1 Chart, 3 Graphs.
Subject
*CURVES in engineering
*SEMICONDUCTORS
*EPITAXY
Language
ISSN
0021-8979
Abstract
Deals with a study which investigated temperature and strain dependence of the roughening transition in III-V semiconductor and SiGe epitaxial growth. Structure of the shape of the transition curve for sufficiently large strain energy values; Way in which the asymptotic behavior in the zero strain energy regime can be reproduced; Capability of the transition curves.