학술논문
Multilayered phase formation after high-fluence implantation of nickel into aluminium.
Document Type
Article
Source
Subject
*SEMICONDUCTORS
*NICKEL
*ALUMINUM
*ION implantation
*
*
*
Language
ISSN
0950-0839
Abstract
The formation of crystalline and amorphous layers has been observed in Al crystals after 5MeV Ni implantation up to a fluence of 7.6 10[sup 17] Ni atomscm[sup -2]. The layers are structured into sublayers perpendicular to the implantation direction with sharp interfaces between the phases and almost symmetrically arranged to both sides of the maximum of the implantation profile. The sublayers of thickness of the order of 100nm were analysed by transmission electron microscopy. They consist of polycrystalline Al[sub 3]Ni, crystalline Al[sub 3]Ni precipitates and small amorphous zones, depending on the local Ni implantation concentration. [ABSTRACT FROM AUTHOR]