학술논문
X-ray Diffraction Study of the Ultrathin Al[sub2]O[sub3]Layer on NiAl(110).
Document Type
Article
Author
Source
Subject
*X-rays
*OPTICAL diffraction
*ALUMINUM oxide
*TETRAHEDRA
*IONIC structure
*CRYSTALLOGRAPHY
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Language
ISSN
0036-8075
Abstract
Ultrathin Al[sub2]O[sub3] layers on alloys are used as templates for model catalysts, tunneling barriers in electronic devices, or corrosion-resistant layers. The complex atomic structure of well-ordered alumina overlayers on NiAl(110) was solved by surface x-ray diffraction. The oxide layer is composed of a double layer of strongly distorted hexagonal oxygen ions that hosts aluminum ions on both octahedral and tetrahedral sites with equal probability. The alumina overlayer exhibits a domain structure that can be related to characteristic growth defects and is generated during the growth of a hexagonally ordered overlayer (Al[sub2]O[sub3]) on a body-centered cubic (110) substrate (NiAl). [ABSTRACT FROM AUTHOR]