학술논문
Effect of Silane Flow Rate on Structure and Corrosion Resistance of Ti-Si-N Thin Films Deposited by a Hybrid Cathodic Arc and Chemical Vapour Process.
Document Type
Article
Source
Subject
*THIN films
*TITANIUM compounds
*SILICON compounds
*NITRIDES
*SILANE
*FLUID dynamics
*CORROSION & anti-corrosives
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Language
ISSN
0256-307X
Abstract
Ti-Si-N thin films with different silicon contents are deposited by a cathodic arc technique in an Ar+N2 +SiH4 mixture atmosphere. With the increase of silane Bow rate, the content of silicon in the Ti-Si-N films varies from 2.0 at. % to 12.2 at. %. Meanwhile, the cross-sectional morphology of these films changes from an apparent columnar microstructure to a dense fine-grained structure. The x-ray diffractometer (XRD) and x-ray photoelectron spectroscopy (XPS) results show that the Ti-Si-N film consists of TiN crystallites and SiNx amorphous phase. The corrosion resistance is improved with the increase of silane Bow rate. Growth defects in the films produced play a key role in the corrosion process, especially for the local corrosion. The porosity of the films decreases from 0.13% to 0.00032% by introducing silane at the Bow rate of 14sccm. [ABSTRACT FROM AUTHOR]