학술논문
An infrared study of thin-film formation on Si and Ge surfaces treated with aqueous NH4F and HF.
Document Type
Article
Author
Source
Subject
*SILICON
*GERMANIUM
*SURFACE chemistry
*HYDROFLUORIC acid
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*
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Language
ISSN
0021-8979
Abstract
Presents information on a study which examined the surface chemistry of silicon and germanium after treatment with hydrofluoric acid buffered with ammonium fluoride using surface infrared spectroscopy. Methodology of the study; Results of the study; Conclusion.