학술논문
Characterizing resists and films with VUV spectroscopic ellipsometry.
Document Type
Article
Author
Source
Subject
*MULTILAYERED thin films
*SEMICONDUCTORS
*VACUUM ultraviolet spectroscopy
*ELLIPSOMETRY
*PHOTORESISTS
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Language
ISSN
0038-111X
Abstract
Describes the characteristics of thin films and multilayers in semiconductor manufacturing using vacuum ultraviolet (VUV) spectroscopic ellipsometry. Advantages of ellipsometry; Capabilities of VUV SE in characterizing photoresists and antireflective coatings.