학술논문
Enhanced electrical and noise properties of nanocomposite vanadium oxide thin films by reactive pulsed-dc magnetron sputtering.
Document Type
Article
Author
Source
Subject
*THIN films
*MAGNETRON sputtering
*VANADIUM
*ELECTRON microscopy
*ELECTRIC noise
*COLUMNAR structure (Metallurgy)
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Language
ISSN
0003-6951
Abstract
Thin films of VOx (1.3 ≤ x ≤ 2) were deposited by reactive pulsed-dc magnetron sputtering of a vanadium metal target while RF-biasing the substrate. Rutherford back scattering, glancing angle x-ray, and cross-sectional transmission electron microscopy measurements revealed the formation of nanocolumns with nanotwins within VOx samples. The resistivity of nanotwinned VOx films ranged from 4 mΩ·cm to 0.6 Ω·cm and corresponding temperature coefficient of resistance between -0.1% and -2.6% per K, respectively. The 1/f electrical noise was analyzed in these VOx samples using the Hooge-Vandamme relation. These VOx films are comparable or surpass commercial VOx films deposited by ion beam sputtering. [ABSTRACT FROM AUTHOR]