소장자료
LDR | 00998camua2200253 a 4500 | ||
001 | 0000138479▲ | ||
005 | 20180519171348▲ | ||
008 | 890809s1990 njua b 001 0 eng ▲ | ||
020 | ▼a 0815512201 : ▼c $86.00▲ | ||
040 | ▼a DLC▼c DLC▼d DLC▲ | ||
050 | 0 | 0 | ▼a TA2020▼b .H37 1990▲ |
082 | 0 | 0 | ▼a 621.044▼2 19▲ |
090 | ▼a 621.044▼b R837h▲ | ||
245 | 0 | 0 | ▼a Handbook of plasma processing technology : ▼b fundamentals, etching, deposition, and surface interactions / ▼c edited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. Westwood.▲ |
260 | 0 | ▼a Park Ridge, N.J., U.S.A. : ▼b Noyes Publications , ▼c c1990.▲ | |
300 | ▼a xxiii, 523 p. : ▼b ill. ; ▼c 25 cm.▲ | ||
440 | 0 | ▼a Materials science and process technology series▲ | |
504 | ▼a Includes bibliographical references.▲ | ||
650 | 0 | ▼a Plasma engineering.▲ | |
650 | 0 | ▼a Semiconductors▼x Etching.▲ | |
650 | 0 | ▼a Plasma etching.▲ | |
700 | 1 | 0 | ▼a Rossnagel, Stephen M.▲ |
700 | 1 | 0 | ▼a Cuomo, J. J.▲ |
700 | 1 | 0 | ▼a Westwood, William D.▼q (William Dickson),▼d 1937-▲ |
![](https://lib.pusan.ac.kr/wp-content/themes/pnul2022/assets/images/default/default_w_279X393.png)
Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions
자료유형
국외단행본
서명/책임사항
Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions / edited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. Westwood.
개인저자
발행사항
Park Ridge, N.J., U.S.A. : Noyes Publications , c1990.
형태사항
xxiii, 523 p. : ill. ; 25 cm.
서지주기
Includes bibliographical references.
ISBN
0815512201
청구기호
621.044 R837h
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