부산대학교 도서관

Shrivastava, Megha; Kala, Abhinav; Dirin, Dmitry; Bodnarchuk, Maryna I; Gopal Achanta, Venu; Kovalenko, Maksym V; Adarsh, K. V.

2022 Conference on Lasers and Electro-Optics (CLEO) Lasers and Electro-Optics (CLEO), 2022 Conference on. :1-2 May, 2022

Shrivastava, Megha; Krieg, Franziska; Bodnarchuk, Maryna I; Kovalenko, Maksym; Adarsh, K. V.

2021 Conference on Lasers and Electro-Optics (CLEO) Lasers and Electro-Optics (CLEO), 2021 Conference on. :1-2 May, 2021

Oddi V; IBM Research Europe - Zurich, Säumerstrasse 4, Rüschlikon 8803, Switzerland.; Department of Chemistry and Applied Biosciences, ETH Zurich, Vladimir Prelog Weg 1, Zürich 8093, Switzerland.; Urbonas D; IBM Research Europe - Zurich, Säumerstrasse 4, Rüschlikon 8803, Switzerland.; Kobiyama E; IBM Research Europe - Zurich, Säumerstrasse 4, Rüschlikon 8803, Switzerland.; Georgakilas I; IBM Research Europe - Zurich, Säumerstrasse 4, Rüschlikon 8803, Switzerland.; Cherniukh I; Department of Chemistry and Applied Biosciences, ETH Zurich, Vladimir Prelog Weg 1, Zürich 8093, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa, Ueberlandstrasse 129, Dübendorf 8600, Switzerland.; Shcherbak K; Department of Chemistry and Applied Biosciences, ETH Zurich, Vladimir Prelog Weg 1, Zürich 8093, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa, Ueberlandstrasse 129, Dübendorf 8600, Switzerland.; Zhu C; Department of Chemistry and Applied Biosciences, ETH Zurich, Vladimir Prelog Weg 1, Zürich 8093, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa, Ueberlandstrasse 129, Dübendorf 8600, Switzerland.; Bodnarchuk MI; Department of Chemistry and Applied Biosciences, ETH Zurich, Vladimir Prelog Weg 1, Zürich 8093, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa, Ueberlandstrasse 129, Dübendorf 8600, Switzerland.; Kovalenko MV; Department of Chemistry and Applied Biosciences, ETH Zurich, Vladimir Prelog Weg 1, Zürich 8093, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa, Ueberlandstrasse 129, Dübendorf 8600, Switzerland.; Mahrt RF; IBM Research Europe - Zurich, Säumerstrasse 4, Rüschlikon 8803, Switzerland.; Rainò G; Department of Chemistry and Applied Biosciences, ETH Zurich, Vladimir Prelog Weg 1, Zürich 8093, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa, Ueberlandstrasse 129, Dübendorf 8600, Switzerland.; Stöferle T; IBM Research Europe - Zurich, Säumerstrasse 4, Rüschlikon 8803, Switzerland.

Publisher: American Chemical Society Country of Publication: United States NLM ID: 101313589 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1936-086X (Electronic) Linking ISSN: 19360851 NLM ISO Abbreviation: ACS Nano Subsets: MEDLINE; PubMed not MEDLINE

Feld LG; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, Switzerland.; Boehme SC; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, Switzerland.; Sabisch S; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, Switzerland.; Frenkel N; Department of Molecular Chemistry and Materials Science, Weizmann Institute of Science, Rehovot, Israel.; Yazdani N; Department of Information Technology and Electrical Engineering, ETH Zürich, Zürich, Switzerland.; Morad V; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, Switzerland.; Zhu C; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, Switzerland.; Kim T; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, Switzerland.; Canossa S; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Zürich, Switzerland.; Svyrydenko M; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, Switzerland.; Tao R; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, Switzerland.; Bodnarchuk MI; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, Switzerland.; Lubin G; Department of Molecular Chemistry and Materials Science, Weizmann Institute of Science, Rehovot, Israel.; Kazes M; Department of Molecular Chemistry and Materials Science, Weizmann Institute of Science, Rehovot, Israel.; Wood V; Department of Information Technology and Electrical Engineering, ETH Zürich, Zürich, Switzerland.; Oron D; Department of Molecular Chemistry and Materials Science, Weizmann Institute of Science, Rehovot, Israel. dan.oron@weizmann.ac.il.; Rainò G; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Zürich, Switzerland. rainog@ethz.ch.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, Switzerland. rainog@ethz.ch.; Kovalenko MV; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Zürich, Switzerland. mvkovalenko@ethz.ch.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, Switzerland. mvkovalenko@ethz.ch.

Publisher: Nature Pub. Group Country of Publication: England NLM ID: 101528555 Publication Model: Electronic Cited Medium: Internet ISSN: 2041-1723 (Electronic) Linking ISSN: 20411723 NLM ISO Abbreviation: Nat Commun Subsets: MEDLINE; PubMed not MEDLINE

Haward TB; Department of Physics, Clarendon Laboratory, University of Oxford, Oxford OX1 3PU, U.K.; Lim VJ; Department of Physics, Clarendon Laboratory, University of Oxford, Oxford OX1 3PU, U.K.; Cherniukh I; Department of Chemistry and Applied Biosciences, Laboratory of Inorganic Chemistry, ETH Zürich, Vladimir-Prelog-Weg 1, Zürich CH-8093, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, Dübendorf CH-8600, Switzerland.; Bodnarchuk MI; Department of Chemistry and Applied Biosciences, Laboratory of Inorganic Chemistry, ETH Zürich, Vladimir-Prelog-Weg 1, Zürich CH-8093, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, Dübendorf CH-8600, Switzerland.; Kovalenko MV; Department of Chemistry and Applied Biosciences, Laboratory of Inorganic Chemistry, ETH Zürich, Vladimir-Prelog-Weg 1, Zürich CH-8093, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, Dübendorf CH-8600, Switzerland.; Herz LM; Department of Physics, Clarendon Laboratory, University of Oxford, Oxford OX1 3PU, U.K.

Publisher: American Chemical Society Country of Publication: United States NLM ID: 101313589 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1936-086X (Electronic) Linking ISSN: 19360851 NLM ISO Abbreviation: ACS Nano Subsets: MEDLINE; PubMed not MEDLINE

Anzini P; Dipartimento di Scienza e Alta Tecnologia and To.Sca.Lab, Universita degli Studi dell'Insubria, Via Valleggio 11, Como, I-22100, Italy.; CLIP-Como Lake Institute of Photonics, via Valleggio 11, Como, 22100, Italy.; Bossuto MC; Dipartimento di Scienza e Alta Tecnologia and To.Sca.Lab, Universita degli Studi dell'Insubria, Via Valleggio 11, Como, I-22100, Italy.; Colombo M; Dipartimento di Scienza e Alta Tecnologia and To.Sca.Lab, Universita degli Studi dell'Insubria, Via Valleggio 11, Como, I-22100, Italy.; Vivani A; Dipartimento di Scienza e Alta Tecnologia and To.Sca.Lab, Universita degli Studi dell'Insubria, Via Valleggio 11, Como, I-22100, Italy.; Cherniukh I; Department of Chemistry and Applied Bioscience, Institute of Inorganic Chemistry, ETH Zurich, Vladimir Prelog Weg 1, Zurich, CH-8093, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials, Science and Technology, Dubendorf, CH-8600, Switzerland.; Bodnarchuk MI; Department of Chemistry and Applied Bioscience, Institute of Inorganic Chemistry, ETH Zurich, Vladimir Prelog Weg 1, Zurich, CH-8093, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials, Science and Technology, Dubendorf, CH-8600, Switzerland.; Kovalenko MV; Department of Chemistry and Applied Bioscience, Institute of Inorganic Chemistry, ETH Zurich, Vladimir Prelog Weg 1, Zurich, CH-8093, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials, Science and Technology, Dubendorf, CH-8600, Switzerland.; Bertolotti F; Dipartimento di Scienza e Alta Tecnologia and To.Sca.Lab, Universita degli Studi dell'Insubria, Via Valleggio 11, Como, I-22100, Italy.; Guagliardi A; Istituto di Cristallografia (IC) and To.Sca.Lab, Consiglio Nazionale delle Ricerche (CNR), via Valleggio 11, Como, I-22100, Italy.; Masciocchi N; Dipartimento di Scienza e Alta Tecnologia and To.Sca.Lab, Universita degli Studi dell'Insubria, Via Valleggio 11, Como, I-22100, Italy.; Ferri F; Dipartimento di Scienza e Alta Tecnologia and To.Sca.Lab, Universita degli Studi dell'Insubria, Via Valleggio 11, Como, I-22100, Italy.; CLIP-Como Lake Institute of Photonics, via Valleggio 11, Como, 22100, Italy.

Publisher: WILEY-VCH Verlag GmbH & Co. KGaA Country of Publication: Germany NLM ID: 101724536 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 2366-9608 (Electronic) Linking ISSN: 23669608 NLM ISO Abbreviation: Small Methods Subsets: MEDLINE; PubMed not MEDLINE

Berezovska Y; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Empa-Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.; Sabisch S; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Empa-Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.; Bernasconi C; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Empa-Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.; Sahin Y; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Empa-Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.; Bertolotti F; Dipartimento di Scienza e Alta Tecnologia & To.Sca.Lab, Università dell'Insubria, 22100 Como, Italy.; Guagliardi A; Istituto di Cristallografia & To.Sca.Lab, Consiglio Nazionale delle Ricerche, 22100 Como, Italy.; Bodnarchuk MI; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Empa-Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.; Dirin DN; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Empa-Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.; Kovalenko MV; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Empa-Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.

Publisher: American Chemical Society Country of Publication: United States NLM ID: 7503056 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1520-5126 (Electronic) Linking ISSN: 00027863 NLM ISO Abbreviation: J Am Chem Soc Subsets: MEDLINE; PubMed not MEDLINE

Ibáñez M; Institute of Science and Technology Austria (ISTA), Am Campus 1, 3400 Klosterneuburg, Austria.; Boehme SC; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, 8093 Zürich, Switzerland.; Laboratory of Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Buonsanti R; Laboratory of Nanochemistry for Energy (LNCE), Department of Chemical Sciences and Engineering, École Polytechnique Fédérale de Lausanne, CH-1950 Sion, Switzerland.; De Roo J; Department of Chemistry, University of Basel, 4058 Basel, Switzerland.; Milliron DJ; McKetta Department of Chemical Engineering, The University of Texas at Austin, Austin, Texas 78712, United States.; Department of Chemistry, University of Texas at Austin, Austin, Texas 78712, United States.; Ithurria S; Laboratoire de Physique et d'Etude des Matériaux, ESPCI-Paris, PSL Research University, Sorbonne Université Univ Paris 06, CNRS UMR 8213, 10 rue Vauquelin, 75005 Paris, France.; Rogach AL; Department of Materials Science and Engineering, and Centre for Functional Photonics (CFP), City University of Hong Kong, 83 Tat Chee Avenue, Kowloon, Hong Kong, SAR 999077, P. R. China.; Cabot A; Catalonia Institute for Energy Research - IREC, Sant Adrià de Besòs, Barcelona 08930, Spain.; ICREA, Pg. Lluís Companys 23, 08010 Barcelona, Spain.; Yarema M; Chemistry and Materials Desing Group, Institute for Electronics, Department of Information Technology and Electrical Engineering, ETH Zurich, Gloriastrasse 35, CH-8092 Zurich, Switzerland.; Cossairt BM; University of Washington, Box 351700, Seattle, Washington 98195-1700, United States.; Reiss P; Univ. Grenoble Alpes, CEA, CNRS, IRIG-SyMMES, STEP, 38000 Grenoble, France.; Talapin DV; Department of Chemistry, James Franck Institute, and Pritzker School of Molecular Engineering, University of Chicago, Chicago, Illinois 60637, United States.; Protesescu L; Zernike Institute for Advanced Materials, University of Groningen, Nijenborgh 3, Groningen 9747AG, The Netherlands.; Hens Z; Physics and Chemistry of Nanostructures, Department of Chemistry, Ghent University, B-9000 Gent, Belgium.; Center for Nano- and Biophotonics, Ghent University, B-9052 Gent, Belgium.; Infante I; BCMaterials, Basque Center for Materials, Applications, and Nanostructures, UPV/EHU Science Park, Leioa 48940, Spain.; Ikerbasque Basque Foundation for Science, Plaza Euskadi 5, Bilbao 48009, Spain.; Bodnarchuk MI; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, 8093 Zürich, Switzerland.; Laboratory of Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Ye X; Department of Chemistry, Indiana University, Bloomington, Indiana 47405, United States.; Wang Y; State Key Laboratory of Coordination Chemistry, School of Chemistry and Chemical Engineering, Nanjing University, Nanjing 210023, China.; Zhang H; Department of Chemistry, Center for BioAnalytical Chemistry, Key Laboratory of Bioorganic Phosphorus Chemistry & Chemical Biology (Ministry of Education), Tsinghua University, Beijing 100084, China.; Lhuillier E; Sorbonne Université, CNRS, Institut des NanoSciences de Paris, 4 Place Jussieu, 75005 Paris, France.; Klimov VI; Nanotechnology and Advanced Spectroscopy Team, C-PCS, Chemistry Division, Los Alamos National Laboratory, Los Alamos, New Mexico 87545, United States.; Utzat H; Department of Materials Science and Engineering, Stanford University, 496 Lomita Mall, Palo Alto, California 94305, United States.; Rainò G; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, 8093 Zürich, Switzerland.; Laboratory of Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Kagan CR; Electrical and Systems Engineering, University of Pennsylvania, Philadelphia, Pennsylvania 19104, United States.; Department of Chemistry, University of Pennsylvania, Philadelphia, Pennsylvania 19104, United States.; Department of Materials Science and Engineering, University of Pennsylvania, Philadelphia, Pennsylvania 19104, United States.; Cargnello M; Department of Chemical Engineering and SUNCAT Center for Interface Science and Catalysis, Stanford University, Stanford, California 94305, United States.; Son JS; Department of Chemical Engineering, Pohang University of Science and Technology (POSTECH), Gyeongsangbuk-do 37673, Republic of Korea.; Kovalenko MV; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, 8093 Zürich, Switzerland.; Laboratory of Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; SKKU Institute of Energy Science and Technology (SIEST), Sungkyunkwan University (SKKU), 2066, Seobu-ro, Jangan-gu, Suwon, Gyeonggi-do 16419, Republic of Korea.

Publisher: American Chemical Society Country of Publication: United States NLM ID: 101313589 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1936-086X (Electronic) Linking ISSN: 19360851 NLM ISO Abbreviation: ACS Nano Subsets: MEDLINE; PubMed not MEDLINE

Zhu C; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.; Feld LG; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.; Boehme SC; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.; Cherniukh I; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.; Bodnarchuk MI; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.; Kovalenko MV; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.; Rainò G; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.

Publisher: American Chemical Society Country of Publication: United States NLM ID: 101088070 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1530-6992 (Electronic) Linking ISSN: 15306984 NLM ISO Abbreviation: Nano Lett Subsets: MEDLINE; PubMed not MEDLINE

Kolomiiets O; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, Dübendorf CH-8600, Switzerland.; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Vladimir Prelog Weg 1, Zürich CH-8093, Switzerland.; Stelmakh A; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, Dübendorf CH-8600, Switzerland.; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Vladimir Prelog Weg 1, Zürich CH-8093, Switzerland.; Rajan A; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, Dübendorf CH-8600, Switzerland.; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Vladimir Prelog Weg 1, Zürich CH-8093, Switzerland.; Sabisch S; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, Dübendorf CH-8600, Switzerland.; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Vladimir Prelog Weg 1, Zürich CH-8093, Switzerland.; Rainò G; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, Dübendorf CH-8600, Switzerland.; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Vladimir Prelog Weg 1, Zürich CH-8093, Switzerland.; Baumketner A; Institute for Condensed Matter Physics, National Academy of Sciences of Ukraine, 1 Svientsitsky Str, Lviv 79011, Ukraine.; Kovalenko MV; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, Dübendorf CH-8600, Switzerland.; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Vladimir Prelog Weg 1, Zürich CH-8093, Switzerland.; SKKU Institute of Energy Science and Technology (SIEST), Sungkyunkwan University (SKKU), 2066, Seobu-ro, Jangan-gu, Suwon, Gyeonggi-do 16419, Republic of Korea.; Bodnarchuk MI; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, Dübendorf CH-8600, Switzerland.; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Vladimir Prelog Weg 1, Zürich CH-8093, Switzerland.

Publisher: American Chemical Society Country of Publication: United States NLM ID: 101313589 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1936-086X (Electronic) Linking ISSN: 19360851 NLM ISO Abbreviation: ACS Nano Subsets: MEDLINE; PubMed not MEDLINE

Dirin DN; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Empa-Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.; Wieczorek A; Empa-Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.; Siol S; Empa-Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.; Kovalenko MV; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Empa-Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.; Bodnarchuk MI; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Empa-Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.

Publisher: American Chemical Society Country of Publication: United States NLM ID: 101088070 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1530-6992 (Electronic) Linking ISSN: 15306984 NLM ISO Abbreviation: Nano Lett Subsets: MEDLINE; PubMed not MEDLINE

Oriel EH; Department of Chemistry, Northwestern University, Evanston, Illinois 60208, United States.; International Institute for Nanotechnology, Northwestern University, Evanston, Illinois 60208, United States.; Shcherbak K; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Dübendorf CH-8600 Switzerland.; Cherniukh I; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Dübendorf CH-8600 Switzerland.; Dirin DN; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Dübendorf CH-8600 Switzerland.; Bodnarchuk MI; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Dübendorf CH-8600 Switzerland.; Kovalenko MV; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Dübendorf CH-8600 Switzerland.; Chen LX; Department of Chemistry, Northwestern University, Evanston, Illinois 60208, United States.; International Institute for Nanotechnology, Northwestern University, Evanston, Illinois 60208, United States.; Chemical Science and Engineering, Argonne National Laboratory, Lemont, Illinois 60439, United States.; Schaller RD; Department of Chemistry, Northwestern University, Evanston, Illinois 60208, United States.; International Institute for Nanotechnology, Northwestern University, Evanston, Illinois 60208, United States.; Center for Nanoscale Materials, Argonne National Laboratory, Lemont, Illinois 60439, United States.

Publisher: American Chemical Society Country of Publication: United States NLM ID: 101088070 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1530-6992 (Electronic) Linking ISSN: 15306984 NLM ISO Abbreviation: Nano Lett Subsets: MEDLINE; PubMed not MEDLINE

Aggarwal N; Indian Institute of Science Education and Research, Department of Physics, Bhopal 462066, India.; Poonia AK; Indian Institute of Science Education and Research, Department of Physics, Bhopal 462066, India.; Dirin DN; ETH Zürich, Department of Chemistry and Applied Biosciences, Laboratory of Inorganic Chemistry, CH-8093 Zürich, Switzerland.; Cherniukh I; Empa - Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.; Sinha A; Jawaharlal Nehru Centre for Advanced Scientific Research, Theoretical Sciences Unit, Bangalore 560, India.; Waghmare UV; Jawaharlal Nehru Centre for Advanced Scientific Research, Theoretical Sciences Unit, Bangalore 560, India.; Bodnarchuk MI; Empa - Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.; Wüster S; Indian Institute of Science Education and Research, Department of Physics, Bhopal 462066, India.; Kovalenko MV; ETH Zürich, Department of Chemistry and Applied Biosciences, Laboratory of Inorganic Chemistry, CH-8093 Zürich, Switzerland.; Empa - Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.; Adarsh KV; Indian Institute of Science Education and Research, Department of Physics, Bhopal 462066, India.

Publisher: American Physical Society Country of Publication: United States NLM ID: 0401141 Publication Model: Print Cited Medium: Internet ISSN: 1079-7114 (Electronic) Linking ISSN: 00319007 NLM ISO Abbreviation: Phys Rev Lett Subsets: MEDLINE; PubMed not MEDLINE

Kobiyama E; IBM Research Europe─Zurich, Säumerstrasse 4, 8803 Rüschlikon, Switzerland.; Urbonas D; IBM Research Europe─Zurich, Säumerstrasse 4, 8803 Rüschlikon, Switzerland.; Aymoz B; Institute of Inorganic Chemistry, Department of Chemistry and Applied Bioscience, ETH Zurich, 8093 Zurich, Switzerland.; Laboratory of Thin Films and Photovoltaics, Empa─Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Bodnarchuk MI; Institute of Inorganic Chemistry, Department of Chemistry and Applied Bioscience, ETH Zurich, 8093 Zurich, Switzerland.; Laboratory of Thin Films and Photovoltaics, Empa─Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Rainò G; Institute of Inorganic Chemistry, Department of Chemistry and Applied Bioscience, ETH Zurich, 8093 Zurich, Switzerland.; Laboratory of Thin Films and Photovoltaics, Empa─Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Olziersky A; IBM Research Europe─Zurich, Säumerstrasse 4, 8803 Rüschlikon, Switzerland.; Caimi D; IBM Research Europe─Zurich, Säumerstrasse 4, 8803 Rüschlikon, Switzerland.; Sousa M; IBM Research Europe─Zurich, Säumerstrasse 4, 8803 Rüschlikon, Switzerland.; Mahrt RF; IBM Research Europe─Zurich, Säumerstrasse 4, 8803 Rüschlikon, Switzerland.; Kovalenko MV; Institute of Inorganic Chemistry, Department of Chemistry and Applied Bioscience, ETH Zurich, 8093 Zurich, Switzerland.; Laboratory of Thin Films and Photovoltaics, Empa─Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Stöferle T; IBM Research Europe─Zurich, Säumerstrasse 4, 8803 Rüschlikon, Switzerland.

Publisher: American Chemical Society Country of Publication: United States NLM ID: 101313589 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1936-086X (Electronic) Linking ISSN: 19360851 NLM ISO Abbreviation: ACS Nano Subsets: MEDLINE; PubMed not MEDLINE

Boehme SC; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, Switzerland.; Nguyen TPT; Univ. Rennes, ENSCR, CNRS, ISCR (Institut des Sciences Chimiques de Rennes)-UMR6226, Rennes, France.; Zhu C; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, Switzerland.; Cherniukh I; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, Switzerland.; Feld LG; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, Switzerland.; Dirin DN; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, Switzerland.; Bodnarchuk MI; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, Switzerland.; Katan C; Univ. Rennes, INSA Rennes, CNRS, Institut FOTON-UMR6082, Rennes, France.; Even J; Univ. Rennes, ENSCR, CNRS, ISCR (Institut des Sciences Chimiques de Rennes)-UMR6226, Rennes, France.; Kovalenko MV; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, Switzerland.; Rainò G; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, Switzerland.

Publisher: Nature Pub. Group Country of Publication: England NLM ID: 101283276 Publication Model: Print-Electronic Cited Medium: Print ISSN: 1749-4885 (Print) Linking ISSN: 17494885 NLM ISO Abbreviation: Nat Photonics Subsets: PubMed not MEDLINE

Tamarat P; Université de Bordeaux, LP2N, Talence, F-33405, France.; Institut d'Optique and CNRS, LP2N, Talence, F-33405, France.; Prin E; Université de Bordeaux, LP2N, Talence, F-33405, France.; Institut d'Optique and CNRS, LP2N, Talence, F-33405, France.; Berezovska Y; Empa-Swiss Federal Laboratories for Materials Science and Technology, CH-8600, Dübendorf, Switzerland.; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093, Zürich, Switzerland.; Moskalenko A; Empa-Swiss Federal Laboratories for Materials Science and Technology, CH-8600, Dübendorf, Switzerland.; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093, Zürich, Switzerland.; Nguyen TPT; Univ Rennes, ENSCR, CNRS, ISCR-UMR 6226, Rennes, F-35000, France.; Xia C; Université de Bordeaux, LP2N, Talence, F-33405, France.; Institut d'Optique and CNRS, LP2N, Talence, F-33405, France.; Hou L; Université de Bordeaux, LP2N, Talence, F-33405, France.; Institut d'Optique and CNRS, LP2N, Talence, F-33405, France.; Trebbia JB; Université de Bordeaux, LP2N, Talence, F-33405, France.; Institut d'Optique and CNRS, LP2N, Talence, F-33405, France.; Zacharias M; Univ Rennes, INSA Rennes, CNRS, Institut FOTON-UMR 6082, F-35000, Rennes, France.; Pedesseau L; Univ Rennes, INSA Rennes, CNRS, Institut FOTON-UMR 6082, F-35000, Rennes, France.; Katan C; Univ Rennes, ENSCR, CNRS, ISCR-UMR 6226, Rennes, F-35000, France.; Bodnarchuk MI; Empa-Swiss Federal Laboratories for Materials Science and Technology, CH-8600, Dübendorf, Switzerland.; Kovalenko MV; Empa-Swiss Federal Laboratories for Materials Science and Technology, CH-8600, Dübendorf, Switzerland.; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093, Zürich, Switzerland.; Even J; Univ Rennes, INSA Rennes, CNRS, Institut FOTON-UMR 6082, F-35000, Rennes, France. jacky.even@insa-rennes.fr.; Lounis B; Université de Bordeaux, LP2N, Talence, F-33405, France. brahim.lounis@u-bordeaux.fr.; Institut d'Optique and CNRS, LP2N, Talence, F-33405, France. brahim.lounis@u-bordeaux.fr.

Publisher: Nature Pub. Group Country of Publication: England NLM ID: 101528555 Publication Model: Electronic Cited Medium: Internet ISSN: 2041-1723 (Electronic) Linking ISSN: 20411723 NLM ISO Abbreviation: Nat Commun Subsets: MEDLINE; PubMed not MEDLINE

Tamarat P; Université de Bordeaux, LP2N, Talence, F-33405, France.; Institut d'Optique and CNRS, LP2N, Talence, F-33405, France.; Prin E; Université de Bordeaux, LP2N, Talence, F-33405, France.; Institut d'Optique and CNRS, LP2N, Talence, F-33405, France.; Berezovska Y; Empa-Swiss Federal Laboratories for Materials Science and Technology, CH-8600, Dübendorf, Switzerland.; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093, Zürich, Switzerland.; Moskalenko A; Empa-Swiss Federal Laboratories for Materials Science and Technology, CH-8600, Dübendorf, Switzerland.; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093, Zürich, Switzerland.; Nguyen TPT; Univ Rennes, ENSCR, CNRS, ISCR-UMR 6226, Rennes, F-35000, France.; Xia C; Université de Bordeaux, LP2N, Talence, F-33405, France.; Institut d'Optique and CNRS, LP2N, Talence, F-33405, France.; Hou L; Université de Bordeaux, LP2N, Talence, F-33405, France.; Institut d'Optique and CNRS, LP2N, Talence, F-33405, France.; Trebbia JB; Université de Bordeaux, LP2N, Talence, F-33405, France.; Institut d'Optique and CNRS, LP2N, Talence, F-33405, France.; Zacharias M; Univ Rennes, INSA Rennes, CNRS, Institut FOTON-UMR 6082, F-35000, Rennes, France.; Pedesseau L; Univ Rennes, INSA Rennes, CNRS, Institut FOTON-UMR 6082, F-35000, Rennes, France.; Katan C; Univ Rennes, ENSCR, CNRS, ISCR-UMR 6226, Rennes, F-35000, France.; Bodnarchuk MI; Empa-Swiss Federal Laboratories for Materials Science and Technology, CH-8600, Dübendorf, Switzerland.; Kovalenko MV; Empa-Swiss Federal Laboratories for Materials Science and Technology, CH-8600, Dübendorf, Switzerland.; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093, Zürich, Switzerland.; Even J; Univ Rennes, INSA Rennes, CNRS, Institut FOTON-UMR 6082, F-35000, Rennes, France. jacky.even@insa-rennes.fr.; Lounis B; Université de Bordeaux, LP2N, Talence, F-33405, France. brahim.lounis@u-bordeaux.fr.; Institut d'Optique and CNRS, LP2N, Talence, F-33405, France. brahim.lounis@u-bordeaux.fr.

Publisher: Nature Pub. Group Country of Publication: England NLM ID: 101528555 Publication Model: Electronic Cited Medium: Internet ISSN: 2041-1723 (Electronic) Linking ISSN: 20411723 NLM ISO Abbreviation: Nat Commun Subsets: MEDLINE; PubMed not MEDLINE

Kazes M; Department of Molecular Chemistry and Materials Science, Weizmann Institute of Science, Rehovot 7610001, Israel.; Nakar D; Department of Molecular Chemistry and Materials Science, Weizmann Institute of Science, Rehovot 7610001, Israel.; Cherniukh I; Laboratory for Thin Films and Photovoltaics, Empa, Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, 8093 Zürich, Switzerland.; Bodnarchuk MI; Laboratory for Thin Films and Photovoltaics, Empa, Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, 8093 Zürich, Switzerland.; Feld LG; Laboratory for Thin Films and Photovoltaics, Empa, Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, 8093 Zürich, Switzerland.; National Centre of Competence in Research (NCCR) Catalysis, ETH Zürich, CH-8093 Zürich, Switzerland.; Zhu C; Laboratory for Thin Films and Photovoltaics, Empa, Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, 8093 Zürich, Switzerland.; Amgar D; Department of Molecular Chemistry and Materials Science, Weizmann Institute of Science, Rehovot 7610001, Israel.; Rainò G; Laboratory for Thin Films and Photovoltaics, Empa, Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, 8093 Zürich, Switzerland.; National Centre of Competence in Research (NCCR) Catalysis, ETH Zürich, CH-8093 Zürich, Switzerland.; Kovalenko MV; Laboratory for Thin Films and Photovoltaics, Empa, Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, 8093 Zürich, Switzerland.; National Centre of Competence in Research (NCCR) Catalysis, ETH Zürich, CH-8093 Zürich, Switzerland.; Oron D; Department of Molecular Chemistry and Materials Science, Weizmann Institute of Science, Rehovot 7610001, Israel.

Publisher: American Chemical Society Country of Publication: United States NLM ID: 101088070 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1530-6992 (Electronic) Linking ISSN: 15306984 NLM ISO Abbreviation: Nano Lett Subsets: MEDLINE; PubMed not MEDLINE

John, Rohit Abraham; Demirağ, Yiğit; Shynkarenko, Yevhen; Berezovska, Yuliia; Ohannessian, Natacha; Payvand, Melika; Zeng, Peng; Bodnarchuk, Maryna I; Krumeich, Frank; Kara, Gökhan; Shorubalko, Ivan; Nair, Manu V; Cooke, Graham A; Lippert, Thomas; Indiveri, Giacomo; Kovalenko, Maksym V

Nat Commun
Nature Communications, Vol 13, Iss 1, Pp 1-10 (2022)
Nature Communications, 13
Nature Communications

Oriel EH; Department of Chemistry, Northwestern University, Evanston, Illinois 60208, United States.; Dirin DN; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Swiss Federal Laboratories for Materials Science and Technology (Empa), CH-8600 Dübendorf, Switzerland.; Shcherbak K; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Swiss Federal Laboratories for Materials Science and Technology (Empa), CH-8600 Dübendorf, Switzerland.; Bodnarchuk MI; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Swiss Federal Laboratories for Materials Science and Technology (Empa), CH-8600 Dübendorf, Switzerland.; Kovalenko MV; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Swiss Federal Laboratories for Materials Science and Technology (Empa), CH-8600 Dübendorf, Switzerland.; Chen LX; Department of Chemistry, Northwestern University, Evanston, Illinois 60208, United States.; Chemical Science and Engineering, Argonne National Laboratory, Lemont, Illinois 60439, United States.; Schaller RD; Department of Chemistry, Northwestern University, Evanston, Illinois 60208, United States.; Center for Nanoscale Materials, Argonne National Laboratory, Lemont, Illinois 60439, United States.

Publisher: American Chemical Society Country of Publication: United States NLM ID: 101526034 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1948-7185 (Electronic) Linking ISSN: 19487185 NLM ISO Abbreviation: J Phys Chem Lett Subsets: MEDLINE; PubMed not MEDLINE