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Maskless nonlinear lithography with femtosecond laser pulses

Document Type

Journal

Author

Koch, J; Fadeeva, E; Engelbrecht, M; Ruffert, C; Gatzen, HH; Ostendorf, A; Chichkov, BN

Source

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING; JAN 2006, 82 1, p23-p26, 4p.

Subject

Language

English

ISSN

09478396

Online Access

EBSCOHost PDF Full Text (ECC - 개별구독 전자저널) Full Text (Springer-Archive) Web of Science JCR 저널정보 Scopus Find it@PNU

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