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Application of ion implantation for mono-Si piezoresistors manufacturing in silicon MEMS technology

Document Type

Journal

Author

Jaroszewicz, B; Domanski, K; Tomaszewski, D; Janus, P; Kudla, A; Latecki, B; Kociubinski, A; Nikodem, M; Katcki, J; Wzorek, M; Marczewski, J; Grabiec, P

Source

VACUUM; MAY 30 2005, 78 2-4, p263-p267, 5p.

Subject

Language

English

ISSN

0042207X

Online Access

Full Text (ScienceDirect) Web of Science JCR 저널정보 Scopus Find it@PNU

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