학술논문

Improvement in short circuit current of p-i-n solar cell with silicon quantum dot superlattice structure by optimizing SiNx thickness
Document Type
Conference
Source
2012 38th IEEE Photovoltaic Specialists Conference Photovoltaic Specialists Conference (PVSC), 2012 38th IEEE. :000810-000814 Jun, 2012
Subject
Photonics and Electrooptics
Power, Energy and Industry Applications
Components, Circuits, Devices and Systems
Engineered Materials, Dielectrics and Plasmas
Photovoltaic cells
Silicon
Absorption
Photonic band gap
Quantum dots
Superlattices
Dielectrics
silicon
amorphous silicon
quantum dot
superlattice
p-i-n solar cell
HWCVD
quantum confinement effect
Language
ISSN
0160-8371
Abstract
Superlattice consisting of 10 alternate layers of a-Si with QDs and SiN x are incorporated as i-layer in a p-i-n solar cell using HWCVD method. Superlattice with QDs showed absorption coefficient in the range of ∼10 5 –10 4 cm −1 . Calculated optical bandgap of the SL with QDs (∼1.84 eV) is higher than the SL without QDs (∼1.79 eV) and this is attributed to QCE. The cells with QDs showed I SC = 1.806 µA and V OC = 25 mV. Increase in I SC of cells is attributed to increase in tunneling current due to decrease in SiN x thickness. Low V OC has been attributed to the thin SiN x layers, the defects and the interface states which result in recombination.