학술논문

A New Interference Phenomenon in Sub-60nm Nitride-Based Flash Memory
Document Type
Conference
Source
2007 22nd IEEE Non-Volatile Semiconductor Memory Workshop Non-Volatile Semiconductor Memory Workshop, 2007 22nd IEEE. :81-82 Aug, 2007
Subject
Components, Circuits, Devices and Systems
Engineered Materials, Dielectrics and Plasmas
Interference
Flash memory
Nonvolatile memory
Testing
Analytical models
Monitoring
Flash memory cells
Dielectrics
Electrons
Electric potential
Language
ISSN
2159-483X
2159-4864
Abstract
It is the first time to disclose that the similar interference from adjacent wordlines as found in floating-gate flash memory also exists in nitride-based flash memory. For sub-60nm nitride-based flash technologies, this interference effect cannot be ignored any more and should be well taken into consideration when defining the operation window of the memory products.