학술논문
Polyphenol derivatives of porphyrins containing fluorene units: Synthesis and positive-tone photoresists for 22-nanometer lithography.
Document Type
Article
Source
Subject
*POLYPHENOLS
*PORPHYRINS
*FLUORENE
*PHOTORESISTS
*LITHOGRAPHY
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Language
ISSN
0012-5008
Abstract
A new strategy was proposed for the synthesis of polyphenol derivatives of fluorene-containing porphyrins to be used as the base for positive-tone photoresists for lithography with exposure at 13.5 nm wavelength, which allow fabrication of microchips with a size of down to 22 nm. Polyphenols based on fluorenecontaining porphyrins were synthesized for the first time. It was shown that these polyphenol derivatives can be used to obtain positive-tone photoresists with a resolution of 22 nm. [ABSTRACT FROM AUTHOR]