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DIFFUSION AND ELECTRICAL BEHAVIOR OF AL IMPLANTED INTO CAPPED SI

Document Type

Journal

Author

SCANDURRA, A; GALVAGNO, G; RAINERI, V; FRISINA, F; TORRISI, A

Source

JOURNAL OF THE ELECTROCHEMICAL SOCIETY; JUL 1993, 140 7, p2057-p2062, 6p.

Subject

Language

English

ISSN

00134651

Online Access

Web of Science JCR 저널정보 Scopus Find it@PNU

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