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Anti-charging process for electron beam observation and lithography

Document Type

Article

Author

Aassime, A.; Hamouda, F.; Richardt, I.; Bayle, F.; Pillard, V.; Lecoeur, P.; Aubert, P.; Bouchier, D.

Source

In Microelectronic Engineering October 2013 110:320-323

Subject

Language

ISSN

0167-9317

Online Access

Full Text (ScienceDirect) Web of Science JCR 저널정보 Scopus Find it@PNU

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