학술논문

Recent advances in resists for 157 nm microlithography

Document Type

Article

Author

Trinque, B.C.; Chiba, T.; Hung, R.J.; Chambers, C.R.; Pinnow, M.J.; Osborn, B.P.; Tran, H.V.; Wunderlich, J.; Hsieh, Y.-T.; Willson, C.G.; Thomas, B.H.; Shafer, G.; Desmarteau, D.D.; Conley, W.

Source

In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. (Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, March 2002, 20(2):531-536)

Subject

Language

English

ISSN

10711023

Online Access

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