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Electron-beam lithography on M108Y and M35G chemically amplified DUV photoresists

Document Type

Article

Author

Maillard, D.; Villanueva, L.G.; Benes, Z.; Piacentini, N.

Source

In: Micro and Nano Engineering. (Micro and Nano Engineering, November 2021, 13)

Subject

Language

English

ISSN

25900072

Online Access

Full Text (ScienceDirect 종량제) Full Text (ScienceDirect O/A) JCR 저널정보 Scopus Find it@PNU

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