학술논문

A New Anisotropic Driving Force Model for SiC Device Simulations
Document Type
Periodical
Source
IEEE Transactions on Electron Devices IEEE Trans. Electron Devices Electron Devices, IEEE Transactions on. 71(3):2024-2029 Mar, 2024
Subject
Components, Circuits, Devices and Systems
Engineered Materials, Dielectrics and Plasmas
Force
Anisotropic magnetoresistance
Impact ionization
Silicon carbide
Semiconductor process modeling
Electron mobility
Semiconductor device modeling
Anisotropy
device simulations
drift-diffusion (DD)
driving force
impact ionization
mobility
silicon carbide (SiC)
TCAD
Language
ISSN
0018-9383
1557-9646
Abstract
We present a new anisotropic driving force model to compute the anisotropy of the mobility and impact ionization rate in TCAD simulations of silicon carbide (SiC) devices. We derive the model from the relationship between mobility, driving force, and carrier heating. The obtained driving force along the ${c}$ -axis and that perpendicular to the ${c}$ -axis depend on the gradient of the quasi-Fermi potential and the mobility anisotropy factor. Since mobility also depends on the driving force, we solve for the mobility anisotropy factor to determine the anisotropic mobility and driving force together. We also propose a new interpolation scheme to consider the anisotropy of the impact ionization rate using the derived anisotropic driving force. We perform the simulation of a 4H-SiC vertical power MOSFET device and compare the present model with the existing models in the commercial simulator.