학술논문

Study of Cryogenic MOSFET Sub-Threshold Swing Using Ab Initio Calculation
Document Type
Periodical
Source
IEEE Electron Device Letters IEEE Electron Device Lett. Electron Device Letters, IEEE. 44(10):1604-1607 Oct, 2023
Subject
Engineered Materials, Dielectrics and Plasmas
Components, Circuits, Devices and Systems
Silicon
Tunneling
Cryogenics
Logic gates
MOSFET
Thermionic emission
Convergence
Ab initio calculation
cryogenic
quantum transport
Si nanowire
technology computer-aided design (TCAD)
Language
ISSN
0741-3106
1558-0563
Abstract
The abnormal subthreshold swing (SS) in Silicon Metal-Oxide Semiconductor Field Effect Transistor (MOSFET) at cryogenic temperature is commonly attributed to band tail (BT) conduction. The cryogenic SS does not scale with the temperature, T, for T $ < 50\text{K}$ and it is observed to saturate at 10mV/dec ~ 20mV/dec at low T in most experiments. Hitherto, only analytical studies have been conducted for BT and its properties. It is not clear how much of its effect can be eliminated should there be an ideal manufacturing technology. In this letter, by using robust ab initio calculation with quantum transport, we have successfully calculated the BT in a Si nanowire (NW) and studied its characteristic length. By analyzing the transport properties of the NW with various gate lengths, $\text{L}_{{\text {G}}}$ , at various temperatures, it is observed that for $\text{L}_{{\text {G}}} < 20$ nm, the tunneling current dominates, and for $\text{L}_{{\text {G}}}>$ 20nm, the BT current dominates at 3K. It is found that, in a perfect nanowire (as a gedanken experimental device), an SS as low as 1.4mV/dec can be achieved at 3K for 15 orders of magnitudes of current change with a minimum of 0.42mV/dec ( $\text{L}_{{\text {G}}}$ = 50nm). This also justifies the results in a recent experiment in which a very low SS (3.4mV/dec at 5.5K) was obtained. Moreover, it is also shown that for the 2nm node ( $\text{L}_{{\text {G}}}~\sim $ 15nm), direct S/D tunneling will set the ultimate limit of SS at 3K.