학술논문

THz bandwidth InP HBT technologies and heterogeneous integration with Si CMOS
Document Type
Conference
Source
2016 IEEE Bipolar/BiCMOS Circuits and Technology Meeting (BCTM) Bipolar/BiCMOS Circuits and Technology Meeting (BCTM), 2016 IEEE. :35-41 Sep, 2016
Subject
Communication, Networking and Broadcast Technologies
Components, Circuits, Devices and Systems
Computing and Processing
Engineered Materials, Dielectrics and Plasmas
Fields, Waves and Electromagnetics
Signal Processing and Analysis
Heterojunction bipolar transistors
Periodic structures
Indium Phosphide
HBT
terahertz
heterogeneous integration
Language
ISSN
2378-590X
Abstract
Through aggressive lithographical and epitaxial scaling, the bandwidths of InP-based heterojunction bipolar transistors have been extended to THz frequencies. At 130nm emitter dimensions, transistors with maximum frequencies of oscillation (ƒ max ) of >1THz have been demonstrated with accompanying circuit demonstrations at 670GHz. At 250nm emitter dimensions, high efficiency and high power density mm-wave power amplifiers covering E-band (71GHz) to G-band (235GHz) have been fabricated. The utility of these high performance transistors can be further enhanced through heterogeneous integration with Si CMOS. We have demonstrated wafer-scale 3D integration of InP and Si using a low temperature oxide-to-oxide bonding process with embedded Cu interconnects.