학술논문
Structure and Properties of Ti-B-C Films Deposited by DC Magnetron Sputtering of TiB2 and B4 C Targets
Document Type
Conference
Author
Source
2021 IEEE 11th International Conference Nanomaterials: Applications & Properties (NAP) Nanomaterials: Applications & Properties (NAP), 2021 IEEE 11th International Conference. :1-4 Sep, 2021
Subject
Language
Abstract
The films in Ti-B-C system have been deposited onto Si (100) substrates by dual direct current magnetron sputtering of TiB 2 and B 4 C targets. During deposition, the sputtering parameters at the TiB 2 target were unchanged, whereas sputtering current at the B 4 C target was varied in the range of 50-200 mA. The films were characterized in terms of their structure, composition, and mechanical properties. The X-ray diffraction measurements showed that all the films contain only TiB 2 crystalline phase of prominent (001) and (002) textures. The film hardness first increased reaching maximum value of about 53.5 GPa for films deposited with 100 mA B 4 C sputtering current, and then it decreased with increasing current. The coefficient of friction of films was unchanged with increasing the sputtering current at B 4 C target.